We were impressed with its ability to clean the contaminants from the printer safely, which also minimized our need to use chemicals.
Dry Ice Cleaning for Semiconductor Equipment
Dry Ice Semiconductor Cleaning
Dry ice is non-abrasive on metal, ceramics & many other substrates and is able to quickly remove all surface contaminants from even the most difficult areas.
Dry Ice Semiconductor Cleaning
Clean more efficiently and reduce downtime and scrap rates
In semiconductor production, the processing equipment must be kept extremely clean in order to prevent product contamination. Traditional cleaning methods present challenges, including costly downtime, the use of chemicals and solvents, hazardous waste disposal and employee exposure to harmful chemicals. Dry ice precision cleaning is an effective method used to decontaminate semiconductor manufacturing equipment. Our dry ice cleaning equipment can assist your semiconductor manufacturing process in a number of ways:
- Clean fixtures after plasma coating processes for microchips and PCB boards
- Remove debris from laser-cut microchip edges
- Clean alloy dies used to manufacture microchip carrier tapes
- Clean molds and dies after microchip molding process
- Clean PCB boards after welding
The environmentally responsible cleaning and surface preparation process is aggressive enough to quickly remove deposition and contamination without impacting the substrate material. Dry ice is non-abrasive on metal, ceramics and many other substrates and is able to quickly remove all surface contaminants from even the most difficult areas of the processing equipment without creating a secondary waste stream.
Cleaning Laser-Cut Microchip Edges in Semiconductor Fabrication
Key Benefits
Benefits & Applications for Dry Ice Semicon Cleaning
- Faster, more effective clean
- Clean in-place without lengthy disassembly
- Non-abrasive, non-flammable & non-conductive
- Reduction or elimination of solvents/acids
- Lower operating costs
- Elimination of grit entrapment
- Safer for employees
- No secondary waste stream
- Environmentally responsible
Applications:
- Wafers
- Masks/Shields
- Chemical Mechanical Polishing (CMP)
- Vacuum pumps
- Conformal coating removal off PCB
- Wafer chamber tooling and components
- Implanters
- Ceramic support discs
- Polycrystalline silicone reactors
- Deposition tooling
- Polishing tooling
- +More
Benefits of Dry Ice Blasting
Always ensure that your manufacturing equipment produce top quality wafers and operate at peak efficiency
Dry ice cleaning is a more effective cleaning solution that provides the ability to clean in-place, without chemicals and without damage, which results in higher performing machinery, increased quality, reduced scrap rates and prolonged equipment life.
- Non-abrasive Will not damage equipment
- Reduce scrap rates
- No secondary waste stream
- Reduce cleaning time and resulting downtime
- Reduce labor costs
- Clean hot and online Minimal to no disassembly required
- Eliminate manual cleaning with harmful chemical solvents
- Environmentally sustainable
- Reduce risk of unplanned production stoppages and costly repairs
- Operationally safe Eliminate manual cleaning and exposure to unsafe conditions
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